Archive · 19 Dec 2025
China's Secret AI Chipmaking Project in Shenzhen
China is working on a secret project in Shenzhen to build machines that make advanced AI chips.
These chips are very important for things like smartphones and defense.
The project is called China's 'Manhattan Project' and is a top priority for the Chinese government.
They are trying to make these machines without help from foreign companies.
The project is very secret, with tight security and special incentives to attract experts.
The goal is to start making chips with this technology by 2028, but some experts think 2030 is more realistic.
There are still many technical challenges to solve, but if successful, this could change the future of AI technology.
China is secretly developing EUV lithography machines for advanced AI chip production in Shenzhen.
The project, dubbed 'Manhattan Project', aims to reduce dependence on foreign firms like ASML.
A prototype machine was completed in early 2025 and is currently undergoing testing.
The project faces major technical challenges and has a target production year of 2028, with 2030 considered more realistic.
The Chinese government is offering high salaries, bonuses, and other incentives to attract experts to the project.
- Who
- China, with involvement from former ASML engineers and Chinese research institutions
- What
- A secret project to develop advanced AI chipmaking machines using EUV technology
- When
- Prototype completed in early 2025, target production by 2028 (official), 2030 (realistic)
- Where
- Shenzhen, China
- Why
- To challenge Western dominance in advanced AI chips and reduce dependence on foreign firms like ASML
- Project Location
- Shenzhen, China
- Project Target Year
- 2028 (official), 2030 (realistic)
- Key Technology
- Extreme Ultraviolet (EUV) lithography machines
- Involved Institutions
- Changchun Institute of Optics, Fine Mechanics and Physics (CIOMP)
- Security Measures
- Compartmentalised teams, isolated work areas, aliases or false identities
- Recruitment Incentives
- High salaries, multimillion-yuan signing bonuses, housing subsidies, tolerance of dual citizenship
- Major Challenges
- Precision optics, overlay accuracy, defect control, throughput, long-term reliability, ecosystem maturity
- Global Context
- ASML is the global leader in EUV lithography machines